The week's pick
Reseach Article
Absorbed Power Measurement in A 2.45 Ghz Microwave Oven at Variable Load and Magnetron Input Voltages
| International Conference on VLSI, Communication & Instrumentation |
| Foundation of Computer Science USA |
| ICVCI - Number 1 |
| None 2011 |
| Authors: Rehana Raj T, Smitha I.S, Subin Thomas, K.Rajeevkumar |
| 6f678683-2bf2-4bba-b617-5d12e8ed6e2f |
Rehana Raj T, Smitha I.S, Subin Thomas, K.Rajeevkumar . Absorbed Power Measurement in A 2.45 Ghz Microwave Oven at Variable Load and Magnetron Input Voltages. International Conference on VLSI, Communication & Instrumentation. ICVCI, 1 (None 2011), 28-32.
Abstract
A domestic microwave oven is utilized to design a microwave plasma (MW) thin film deposition unit with variable magnetron input voltage control. Calorimetric calibrations were carried out to analyze the power absorbed in microwave oven for different magnetron input voltages, load parameters, time of heating and different positions in microwave cavity. The experiments were conducted in two different types of domestic ovens and power measurements were compared. The absorbed power in microwave oven is found to change with parameters like magnetron input voltage, load volume, heating time and the position within the MW oven cavity. The absorbed power for varying magnetron input levels from 230 V to 160 V was consistent for several repeats of the experiments. Power distribution measurements were useful in deciding the position of plasma chamber in the MW thin film deposition unit.
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