This research investigates nanoscale droplet deposition phenomena towards developing nanomanufacturing processes. The deposition and spreading behavior of water nanodroplet on SiO2 and Si3N4 substrates is studied using molecular dynamics simulation. The effect of temperature variations on the dynamic contact angle during the wetting phenomena is observed. SiO2 and Si3N4 substrates reveal a hydrophilic and hydrophobic interaction with water, respectively. An experimental design is conducted to observe the effect of substrate type and temperature on the time to reach equilibrium contact angle. Both factors and their interaction have a statistical significant effect on the equilibration time. The results of this research form a basis to predict wetting behavior for aqueous colloids on different substrates towards nanoscale manufacturing.

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Computational Modeling Nanotechnology Nanodroplet Nanomanufacturing Statistical Analysis Substrate Deposition