Emerging Trends in Computing |
Foundation of Computer Science USA |
ETC2016 - Number 3 |
March 2017 |
Authors: Shinde Madhuri N, Shahane Nitin M |
b0bfe462-8560-485a-82a9-b7873259f0c7 |
Shinde Madhuri N, Shahane Nitin M . Face Sketch Synthesis using Bilateral Symmetry. Emerging Trends in Computing. ETC2016, 3 (March 2017), 1-4.
Method of creating sketch from available photograph is known as sketch synthesis. To synthesize face sketch, similarity between different photograph patches is evaluated. Existing patch level method requires huge computational time and space for finding candidate photograph patches. Photograph patches are replaced by sparse coefficients using sparse coding. Sparse representation is used to select candidate photograph patches. Then greedy search is used to measure the similarity between the test photograph patch and the training photograph patch. Final candidate patches are stitched to get synthesized sketch. By using bilateral symmetry, it tends to achieve high efficiency of the system.