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Reseach Article

Performance and Analysis of Voltage Scaled Repeaters for Multi-Walled Carbon Nanotubes as VLSI Interconnects

by Jatinderpal, Chakshu Goel, Karamjit Singh Sandha
International Journal of Computer Applications
Foundation of Computer Science (FCS), NY, USA
Volume 93 - Number 8
Year of Publication: 2014
Authors: Jatinderpal, Chakshu Goel, Karamjit Singh Sandha
10.5120/16235-5756

Jatinderpal, Chakshu Goel, Karamjit Singh Sandha . Performance and Analysis of Voltage Scaled Repeaters for Multi-Walled Carbon Nanotubes as VLSI Interconnects. International Journal of Computer Applications. 93, 8 ( May 2014), 18-23. DOI=10.5120/16235-5756

@article{ 10.5120/16235-5756,
author = { Jatinderpal, Chakshu Goel, Karamjit Singh Sandha },
title = { Performance and Analysis of Voltage Scaled Repeaters for Multi-Walled Carbon Nanotubes as VLSI Interconnects },
journal = { International Journal of Computer Applications },
issue_date = { May 2014 },
volume = { 93 },
number = { 8 },
month = { May },
year = { 2014 },
issn = { 0975-8887 },
pages = { 18-23 },
numpages = {9},
url = { https://ijcaonline.org/archives/volume93/number8/16235-5756/ },
doi = { 10.5120/16235-5756 },
publisher = {Foundation of Computer Science (FCS), NY, USA},
address = {New York, USA}
}
%0 Journal Article
%1 2024-02-06T22:15:16.607864+05:30
%A Jatinderpal
%A Chakshu Goel
%A Karamjit Singh Sandha
%T Performance and Analysis of Voltage Scaled Repeaters for Multi-Walled Carbon Nanotubes as VLSI Interconnects
%J International Journal of Computer Applications
%@ 0975-8887
%V 93
%N 8
%P 18-23
%D 2014
%I Foundation of Computer Science (FCS), NY, USA
Abstract

Multi-walled carbon nanotubes (MWCNT) are promising candidates for futuristic Nano-electronic applications. MWCNT have potential to replace on-chip copper (Cu) interconnects due to their large conductivity and current carrying capabilities. Delay is one of the major design constraints in very large scale integration (VLSI) circuits. This paper presents an analysis of propagation delay and effect of repeater insertion on propagation delay for both MWCNT and Cu interconnects at different technology nodes viz 32nm and 22nm. In addition this paper deals with effect of voltage scaling in repeaters for long interconnects length in VLSI circuits in terms as propagation delay. It has been observed that propagation delay reduces with increase in bias voltage of the repeater at different interconnects length and technology nodes (32nm. 22nm).

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Index Terms

Computer Science
Information Sciences

Keywords

Carbon Nanotubes (CNT) Multi-walled CNT (MWCNT) Interconnects Circuit Model.