CFP last date
20 December 2024
Reseach Article

Performance Analysis of FinFET based Carry save Adder Cell with Predictive Technology Models

by Suresh Singh Baghel, Manjit Kaur, Gurmohan Singh
International Journal of Computer Applications
Foundation of Computer Science (FCS), NY, USA
Volume 127 - Number 4
Year of Publication: 2015
Authors: Suresh Singh Baghel, Manjit Kaur, Gurmohan Singh
10.5120/ijca2015906361

Suresh Singh Baghel, Manjit Kaur, Gurmohan Singh . Performance Analysis of FinFET based Carry save Adder Cell with Predictive Technology Models. International Journal of Computer Applications. 127, 4 ( October 2015), 5-9. DOI=10.5120/ijca2015906361

@article{ 10.5120/ijca2015906361,
author = { Suresh Singh Baghel, Manjit Kaur, Gurmohan Singh },
title = { Performance Analysis of FinFET based Carry save Adder Cell with Predictive Technology Models },
journal = { International Journal of Computer Applications },
issue_date = { October 2015 },
volume = { 127 },
number = { 4 },
month = { October },
year = { 2015 },
issn = { 0975-8887 },
pages = { 5-9 },
numpages = {9},
url = { https://ijcaonline.org/archives/volume127/number4/22715-2015906361/ },
doi = { 10.5120/ijca2015906361 },
publisher = {Foundation of Computer Science (FCS), NY, USA},
address = {New York, USA}
}
%0 Journal Article
%1 2024-02-06T23:18:57.935491+05:30
%A Suresh Singh Baghel
%A Manjit Kaur
%A Gurmohan Singh
%T Performance Analysis of FinFET based Carry save Adder Cell with Predictive Technology Models
%J International Journal of Computer Applications
%@ 0975-8887
%V 127
%N 4
%P 5-9
%D 2015
%I Foundation of Computer Science (FCS), NY, USA
Abstract

As scaling of conventional metal-oxide-semiconductor field effect transistor is approaching its fundamental and technological limits, alternate device solutions are being developed. FinFET is rapidly replacing conventional CMOS transistors as it offer lot of improvements in power consumption, propagation delay and propagation delay product (PDP). This paper presents design & simulation of a double gate FinFET based ultra low power 2-bit Carry Save Adder (CSA) cell. A comprehensive comparison of FinFET and CMOS based 2-bit carry save adder has been performed. The CMOS & FinFET based 2-bit carry save adder circuits are evaluated at 32nm & 45nm nanoscale technology nodes using Predictive Technology Models (PTM). At 45nm technology node, the FinFET based carry save adder results shows average power consumption reduction of 39.75%; propagation delay reduction of 92.50% and a propagation delay product (PDP) improvement of 94.42% as compared to CMOS counterparts. The FinFET based carry save adder results shows average power consumption reduction of 42.19%; propagation delay reduction of 86.86% and a propagation delay product (PDP) improvement of 92.22% as compared to CMOS based carry save adder at 32nm technology node.

References
  1. D. Hisamoto, W.-C. Lee, J. Kedzierski et al., “FinFET—a self aligned double-gate MOSFET scalable to 20 nm,” IEEE Transactions on Electron Devices, vol.47, no.12, pp. 2320–2325, 2000.
  2. B. Raj, A. K. Saxena and S. Dasgupta, “Quantum Mechanical Analytical Modeling of Nanoscale DG FinFET: Evaluation of Potential, Threshold Voltage and Source/Drain Resistance ” Elsevier’s Journal of Material Science in Semiconductor Processing, Elsevier, Vol. 16, issue 4, pp. 1131- 1137, 2013.
  3. B. Raj, A. K. Saxena and S. Dasgupta, “Analytical Modeling for the Estimation of Leakage Current and Subthreshold Swing Factor of Nanoscale Double Gate FinFET Device” Microelectronics International, UK, vol. 26, pp. 53-63, 2009.
  4. B. Raj, A. K. Saxena and S. Dasgupta, “A Compact Drain Current and Threshold Voltage Quantum Mechanical Analytical Modeling for FinFETs” Journal of Nanoelectronics and Optoelectronics (JNO), USA, vol. 3, no. 2, pp. 163-170, 2008.
  5. B. Yu, L. Chang, S. Ahmed et al., “FinFET scaling to 10 nm gate length,” in Proceedings of the IEEE International Devices Meeting (IEDM '02), pp. 251–254, San Francisco, Calif, USA, December 2002.
  6. B. Raj, A. K. Saxena and S. Dasgupta, “Nanoscale FinFET Based SRAM Cell Design: Analysis of Performance metric, Process variation, Underlapped FinFET and Temperature effect” IEEE Circuits and System Magazine, vol. 11, issue 2, pp. 38- 50, 2011.
  7. S. Tang, L. Chang, N. Lindert et al., “FinFET—a quasi-planar double-gate MOSFET,” in Proceedings of the International of Solid-State Circuits Conference, pp. 118–119, February 2001.
  8. I.P.Colinge, FinFETs and Other Multi-Gate Transistors, 1st ed. Springer: New York, 2008, pp. 4-25.
  9. K.Kim at al., "Leakage power analysis of 25-nm double-gate CMOS devices and circuits," IEEE Trans. Electron Devices, vol. 52, no. 5, pp.980-986, May 2005.
  10. P. Mishra and N.K. Jha, “Low-power FinFET circuit synthesis using surface orientation optimization,” in Proc. Design Automation and Test in Europe, pp. 311–314 March 2010.
  11. K. Akarvardar, C. D. Young, D. Veksler, K.-W. Ang, I. Ok, M. Rodgers et al., "Performance and variability in multi-VT FinFETs using fin doping," in Proc. VLSI TSA, 2012,
  12. M. Guillorn, J. Chang, A. Bryant et al., “FinFET performance advantage at 22 nm: an AC perspective,” in Proceedings of the Symposium on VLSI Technology Digest of Technical Papers (VLSIT ’08), pp.12–13, June2008.
  13. J.Gu, J.Keane, S.Sapatnekar, andC.H.Kim, “Statistical leakage estimation of double gate FinFET devices considering the width quantization property, ” IEEE Transactions on Very Large Scale Integration Systems, vol. 16, no. 2, pp. 206–209, 2008.
  14. D.Ha, H.Takeuchi, Y.-K.Choi,and T.-J.King, “Molybdenum gate technology for ultrathin-body MOSFETs and FinFETs, ” IEEE Transactions on Electron Devices, vol.51, no.12, pp.1989–1996, 2004.
  15. T. Sairam, W. Zhao, and Y. Cao, “Optimizing FinFET technology for high-speed and low-power design,” in Proceedings of the 17th Great Lakes Symposium on VLSI (GLSVLSI ’07), pp.73–77, March 2007.
  16. Keunwoo Kim; Kanj, R.; Joshi, R.V., "Impact of FinFET technology for power gating in nano-scale design," Quality Electronic Design (ISQED), 2014 15th International Symposium on, vol., no., pp.543, 547, 3-5 March 2014.
  17. E. R. Hsieh and S. S. Chung, "The proximity of strain induced effect to improve the electron mobility in a silicon carbon source-drain structure of n-channel metal-oxide semiconductor field-effect transistors," Appl. Phys. Lett., vol. 96, no. 9, pp. 093501, March 2010.
  18. 32nm sub-circuit model for double gate FinFET[Online]. Available: http://ptm.asu.edu/modelcard/32nm_finfet.rar
  19. 45nm sub-circuit model for double gate FinFET[Online]. Available: http://ptm.asu.edu/modelcard/45nm_finfet.rar
  20. S.Sinha et al., “Exploring sub-20nm FinFET design with Predictive Technology Models,” in Design Automation Conference (DAC), 2012 49th ACM/EDAC/IEEE, pp. 283 –288, June 2012.
Index Terms

Computer Science
Information Sciences

Keywords

CMOS FinFET CSA PDP AND XOR OR Double-gate.