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Reseach Article

Circumventing Short Channel Effects in FETs: Review

by Khairnar Vinayak Prakash, Abhijeet Kumar, Prerana Jain
International Journal of Computer Applications
Foundation of Computer Science (FCS), NY, USA
Volume 117 - Number 17
Year of Publication: 2015
Authors: Khairnar Vinayak Prakash, Abhijeet Kumar, Prerana Jain
10.5120/20648-3407

Khairnar Vinayak Prakash, Abhijeet Kumar, Prerana Jain . Circumventing Short Channel Effects in FETs: Review. International Journal of Computer Applications. 117, 17 ( May 2015), 24-30. DOI=10.5120/20648-3407

@article{ 10.5120/20648-3407,
author = { Khairnar Vinayak Prakash, Abhijeet Kumar, Prerana Jain },
title = { Circumventing Short Channel Effects in FETs: Review },
journal = { International Journal of Computer Applications },
issue_date = { May 2015 },
volume = { 117 },
number = { 17 },
month = { May },
year = { 2015 },
issn = { 0975-8887 },
pages = { 24-30 },
numpages = {9},
url = { https://ijcaonline.org/archives/volume117/number17/20648-3407/ },
doi = { 10.5120/20648-3407 },
publisher = {Foundation of Computer Science (FCS), NY, USA},
address = {New York, USA}
}
%0 Journal Article
%1 2024-02-06T22:59:39.405322+05:30
%A Khairnar Vinayak Prakash
%A Abhijeet Kumar
%A Prerana Jain
%T Circumventing Short Channel Effects in FETs: Review
%J International Journal of Computer Applications
%@ 0975-8887
%V 117
%N 17
%P 24-30
%D 2015
%I Foundation of Computer Science (FCS), NY, USA
Abstract

The present paper aims at providing a thorough and yet a collective evaluation of some commendable research works done over the past decade with the aim for reducing short-channel effects (SCE). The necessity for development of these technologies arose as short channel effects such as – Drain-Induced Barrier Lowering (DIBL) and hot carrier effects arises manifold as the channel length is scaled further into the deep-submicron region to accommodate changes in ULSI applications. The review highlights some recent techniques to circumvent these effects in fabricated MOS devices, and in addition a short evaluation of strengths and weakness in each research works is also presented.

References
  1. Jingon Jang, Younggul Song, Hyuntaek Oh, Daekyoung Yoo, Dongku Kim, Hyungwoo Lee, Seunghun Hong, Jin-Kyun Lee, and Takhee Lee. 2014. The application of orthogonal photolithography to micro-scale organic field effect transistors and complementary inverters on flexible substrate. Appl. Phys. Lett. 104, 053301 (2014), 053301- 053301-5.
  2. R. K. Mangang, K. Murugan. 2014. Power gating in FinFET Adiabatic circuits in Proc. IEEE Int. conf. Green Computing on Communication and Electrical Engineering, 2014, 1-5, doi: 10. 1109/ICGCCEE. 2014. 6922293
  3. Shekhar Yadav, Jagdeep Rahul. 2014. Analysis of Split gate technology for nano-scale Double gate MOSFET devices. International Journal of Scientific Engineering and Technology, Volume No. 3, Issue No. 5, 664-665.
  4. Meander Veshala, Ramchander Jatooth, And Kota Rajesh Reddy. 2013. "Reduction of Short-Channel Effects in FinFET," Intl. Journal of Engg. And Innovative technology (IJEIT), Volume No. 2, Issue 9, 2013, 118-124.
  5. S. P. Pandey, S. Khandelwal, S. Akashe. 2013. Multiple-gate silicon on insulator (SOI) MOSFETs: Device design and analysis. In Proc. IEEE Intl. Conf. on Microelectronics, Communication and renewable Energy, 2013, 1-6, doi: 10. 1109/AICERA-ICMiCR. 2013. 6575969.
  6. Prashant Mani, Manoj Kumar Pandey. 2012. Silicon on Insulator MOSFET Development from Single Gate to Multiple Gate. International Journal of Advanced Research in Computer Science and Software Engineering, Vol. 2, Issue 6, 297-300.
  7. Yang Chai, Arash Hazeghi, Kuniharu Takei, Hong-Yu Chen, Philip C. H. Chan, Ali Javey and H. -S. Philip Wong. 2012. Low-Resistance electrical Contact to Carbon nanotubes with Gaphitic Interficial layer. IEEE Trans. On Electron devices, Vol. 59, No. 1, January, 2012, 12-19.
  8. Rupendra Kumar Sharma, Mathias Bucher. 2012. Device Design Engineering for Optimum Analog/RF Performance of Nanoscale DG MOSFETs. IEEE Trans. On nanotechnology, Vol. 11, No. 5, Sept. 2012, 992-998.
  9. Deepesh Ranka, Ashwani K. , Rakesh Kumar, Devendra Giri. 2011. Performance Analysis of FD-SOI MOSFET with different Gate Spacer Dielectric. International Journal of Computer Applications, Vol. 18, No. 5, March, 2011, 22-27.
  10. Rupendra Kumar Sharma, Mridula Gupta, R. S. Gupta. 2011. TCAD Assessment of Device Design Technologies for Enhanced Performance of Nanoscale DG MOSFET. IEEE Trans. On electron devices, Vol. 58, No. 9, Sept. 2011, 2936-2943.
  11. Eleftherios G. Ioannidis, Andreas Tsormpatzoglou, Dimitrios H. Tassis, Charalabos A. Dimitriadis, Gérard Ghibaudo, and Jalal Jomaah. 2011. Effect of Localized Interface Charge on the Threshold Voltage of Short-Channel Undoped Symmetrical Double-Gate MOSFETs. IEEE Trans. on Electron devices, Vol. 58, No. 2, Feb. 2011, 433-440.
  12. Sajad A. Loan, S. Qureshi, and S. Sundar Kumar Iyer. 2010. A Novel partial-Ground-Plane-Based MOSFET on Selective Buried Oxide: 2-D simulation Study. IEEE Trans. on Electron devices, Vol. 57, No. 3, March 2010, 671-680.
  13. Zahra Arefinia, Ali A. Orouji. 2008. Impact of single halo implementation on the carbon nanotube field effect transistor: A quantum simulation study. Physica E 41 (2008), 196-201.
  14. Vivek Venkataraman, Susheel Nawal, and M. Jagadesh Kumar. 2007. Compact Analytical Threshold-Voltage Model of Nanoscale Fully Depleted Strained-Si on Silicon-Germanium-on-Insulator (SGOI) MOSFETs. IEEE Trans. on electron devices, Vol. 54, No. 3, march 2007, 554-562.
  15. M. Jagadesh Kumar, Ali A. Orouji, and Harshit Dhakad. 2006. New Dual-Material SG nanoscale MOSFET: Analytical Threshold-Voltage Model. IEEE Trans. on Electron devices, Vol. 56, No. 4, April 2006, 920-923.
  16. Ali A. Orouji and M. Jagadesh Kumar. 2005. Shielded Channel Double-Gate MOSFET: A Novel Device for Reliable Nanoscale CMOS Applications. IEEE Trans. on Devices and materials reliability, Vol. 5, No. 3, Sept. 2005, 509-514.
  17. Anurag Chaudhry and M. Jagadesh Kumar. 2004. Controlling Short-Channel Effects in Deep-submicron SOI MOSFETs for Improved Reliability: A Review. IEEE Trans. on device and materials reliability, Vol. 4, No. 1, pp. 99-109.
  18. Iwai Hiroshi, Natori Kenji, Shiraishi Kenji, Iwata Jun-ichi, Oshiyama Atsushi, Yamada Keisaku, Ohmori Kenji, Kakushima Kuniyuki, Ahmet Parhat. 2011. Si nanowire FET and its modeling. Science China information sciences, Vol. 54, No. 5, 1004-1011, doi: 10. 1007/s11432-011-4220-0.
Index Terms

Computer Science
Information Sciences

Keywords

Short-Channel effects (SCE) Silicon on Insulator (SOI) Drain Induced Barrier level (DIBL) deep-submicron ULSI.